Randy W. Mann
After receiving his Masters degree in Metallurgical Engineering and Material Science in 1982 from Notre Dame University, Randy joined the IBM technology development team in Essex Junction, VT. He worked for 25 years in the advanced silicon technology development group with IBM. He has 71 US patents and 41 technical papers in the field of semiconductor devices, microelectronic structures and processes. His expertise includes process integration, semiconductor device physics, materials science, yield learning, high performance logic development, Iddq analysis, DRAM and SRAM technology. Recently he played a key role in the 130nm and 65nm technology development at the IBM SRDC in East Fishkill, NY until joining RFMD to be the technology team lead for the 90nm advanced silicon effort. Randy is currently at the University of Virginia in the Ph. D. program in electrical engineering. Member IEEE.